Invention Grant
- Patent Title: Conductor assembly including a flared aperture region
- Patent Title (中): 导体组件包括扩口孔区域
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Application No.: US12133645Application Date: 2008-06-05
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Publication No.: US07880578B2Publication Date: 2011-02-01
- Inventor: Rainer Meinke
- Applicant: Rainer Meinke
- Applicant Address: US FL Palm Bay
- Assignee: Advanced Magnet Lab, Inc.
- Current Assignee: Advanced Magnet Lab, Inc.
- Current Assignee Address: US FL Palm Bay
- Agency: Beusse, Wolter, Sanks, Mora & Maire, P.A.
- Agent Ferdinand M. Romano
- Main IPC: H01F27/28
- IPC: H01F27/28 ; B21F3/04 ; B21C47/14 ; B65H39/16 ; H01G4/32 ; H01H1/00

Abstract:
A conductor assembly of the type which, when conducting current, generates a magnetic field or in which, in the presence of a changing magnetic field, a voltage is induced. A helical wiring pattern is positioned along an axis a radial distance R from the axis. The wiring pattern is formed about an aperture region extending from the axis toward the wiring pattern, the distance R varying along a portion of the axis.
Public/Granted literature
- US20090085709A1 Conductor Assembly Including A Flared Aperture Region Public/Granted day:2009-04-02
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