Invention Grant
US07880864B2 Stage apparatus, exposure apparatus, and device manufacturing method
失效
舞台装置,曝光装置和装置的制造方法
- Patent Title: Stage apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 舞台装置,曝光装置和装置的制造方法
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Application No.: US11964248Application Date: 2007-12-26
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Publication No.: US07880864B2Publication Date: 2011-02-01
- Inventor: Yugo Shibata
- Applicant: Yugo Shibata
- Applicant Address: JP
- Assignee: Canon Kabusiki Kaisha
- Current Assignee: Canon Kabusiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2006-353175 20061227; JP2007-326587 20071218
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/62

Abstract:
This invention relates to a stage apparatus including a first stage, a second stage mounted on the first stage, a first actuator which drives the first stage in a first direction, and a second actuator which drives the second stage such that the second stage moves relative to the first stage. The stage apparatus also includes a first unit including a first movable magnet arranged at an end of the first stage in the first direction, and a first stationary magnet which faces the first movable magnet and generates a repulsive force against the first movable magnet. The stage apparatus also includes a second unit including a second movable magnet arranged at the two ends of the second stage in the first direction, and a second stationary magnet which faces the second movable magnet and generates a repulsive force against the second movable magnet.
Public/Granted literature
- US20080158539A1 STAGE APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2008-07-03
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