Invention Grant
- Patent Title: Light wave interferometer apparatus
- Patent Title (中): 光波干涉仪
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Application No.: US12334034Application Date: 2008-12-12
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Publication No.: US07880897B2Publication Date: 2011-02-01
- Inventor: Zongtao Ge
- Applicant: Zongtao Ge
- Applicant Address: JP Saitama-shi
- Assignee: Fujinon Corporation
- Current Assignee: Fujinon Corporation
- Current Assignee Address: JP Saitama-shi
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPP2007-340136 20071228; JPP2008-029531 20080208
- Main IPC: G01B9/02
- IPC: G01B9/02

Abstract:
The light wave interferometer apparatus is provided and includes: a luminous flux, which is sent from the light source and divided into two portions by the luminous flux separation and composition unit, are combined with each other again under the condition that the divided luminous fluxes hold wavefront information corresponding to the surface shapes of the aspherical lens to be inspected and the reference aspherical lens by the respectively corresponding basis spherical lenses. Therefore, a wavefront difference of the aspherical lens to be inspected with respect to the reference aspherical lens is made to be interference fringe information and formed on an image pickup plane of the interferometer CCD camera. The basis spherical lenses have the basis spherical surfaces, the curvatures of which are equal to each other.
Public/Granted literature
- US20090168076A1 LIGHT WAVE INTERFEROMETER APPARATUS Public/Granted day:2009-07-02
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