Invention Grant
- Patent Title: Lithographic apparatus and method for calibrating the same
- Patent Title (中): 平版印刷设备及其校准方法
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Application No.: US12781202Application Date: 2010-05-17
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Publication No.: US07880901B2Publication Date: 2011-02-01
- Inventor: Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
- Applicant: Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01B11/14
- IPC: G01B11/14 ; G01B11/02
Abstract:
A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
Public/Granted literature
- US20100220335A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME Public/Granted day:2010-09-02
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