Invention Grant
US07881010B2 Process for self-aligned flare point and shield throat definition prior to main pole patterning
有权
在主极图案化之前,自对准耀斑和屏蔽喉定义的过程
- Patent Title: Process for self-aligned flare point and shield throat definition prior to main pole patterning
- Patent Title (中): 在主极图案化之前,自对准耀斑和屏蔽喉定义的过程
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Application No.: US11956277Application Date: 2007-12-13
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Publication No.: US07881010B2Publication Date: 2011-02-01
- Inventor: Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
- Applicant: Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: G11B5/187
- IPC: G11B5/187

Abstract:
A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.
Public/Granted literature
- US20090152234A1 PROCESS FOR SELF-ALIGNED FLARE POINT AND SHIELD THROAT DEFINITION PRIOR TO MAIN POLE PATTERNING Public/Granted day:2009-06-18
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