Invention Grant
- Patent Title: Surface-emission semiconductor laser device
- Patent Title (中): 表面发射半导体激光器件
-
Application No.: US12103142Application Date: 2008-04-15
-
Publication No.: US07881359B2Publication Date: 2011-02-01
- Inventor: Noriyuki Yokouchi , Norihiro Iwai
- Applicant: Noriyuki Yokouchi , Norihiro Iwai
- Applicant Address: JP Tokyo
- Assignee: The Furukawa Electric Co., Ltd
- Current Assignee: The Furukawa Electric Co., Ltd
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP11-115964 19990423
- Main IPC: H01S3/097
- IPC: H01S3/097 ; H01S5/00

Abstract:
A surface-emitting semiconductor laser device includes a semi-insulating substrate, a layer structure with a bottom multilayer reflector, an n-type cladding layer, an active layer structure for emitting laser, a p-type cladding layer and a top multilayer reflector with a dielectric material, consecutively formed on the semi-insulating substrate, the active layer structure, the p-type cladding layer and the top multilayer reflector, configuring a mesa post formed on a portion of the n-type cladding layer, the p-type cladding layer or the p-type multilayer reflector. The surface-emitting semiconductor laser includes a p-side electrode formed on another portion of the p-type cladding layer, and an n-side electrode formed on another portion of the n-type cladding layer. The n-side electrode includes a substantially uniform Au film and AuGeNi film or AuGe film consecutively formed on the n-type cladding layer, and an alloy is formed between said Au film and said AuGeNi film or AuGe film.
Public/Granted literature
- US20080254566A1 SURFACE-EMISSION SEMICONDUCTOR LASER DEVICE Public/Granted day:2008-10-16
Information query