Invention Grant
- Patent Title: Wide-coverage x-ray source with dual-sided target
- Patent Title (中): 具有双面目标的宽覆盖x射线源
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Application No.: US12317908Application Date: 2008-12-30
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Publication No.: US07881425B2Publication Date: 2011-02-01
- Inventor: Mark E Vermilyea , James E Simpson
- Applicant: Mark E Vermilyea , James E Simpson
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Jason K. Klindtworth
- Main IPC: H05G1/60
- IPC: H05G1/60 ; H01J35/06 ; H01J35/00

Abstract:
An x-ray source is disclosed comprising: an anode disk with first and second beveled annuli at a periphery of the anode disk, the anode disk rotatably coupled to a housing structure via a support shaft; first and second cathodes mounted to a yoke support structure, the yoke support structure configured to direct cathode emissions at x-ray generating material disposed on the beveled annuli; and a high-voltage insulator configured to electrically insulate the yoke support structure from the housing structure.
Public/Granted literature
- US20100166141A1 Wide-coverage x-ray source with dual-sided target Public/Granted day:2010-07-01
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