- Patent Title: Methods for altering one or more parameters of a measurement system
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Application No.: US12421186Application Date: 2009-04-09
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Publication No.: US07881518B2Publication Date: 2011-02-01
- Inventor: Edward Calvin , Wayne D. Roth
- Applicant: Edward Calvin , Wayne D. Roth
- Applicant Address: US TX Austin
- Assignee: Luminex Corporation
- Current Assignee: Luminex Corporation
- Current Assignee Address: US TX Austin
- Agency: Daffer McDaniel, LLP
- Agent Kevin L. Daffer; Mollie E. Lettang
- Main IPC: G06K9/00
- IPC: G06K9/00 ; C12Q1/68

Abstract:
Methods for altering one or more parameters of a measurement system are provided. One method includes analyzing a sample using the system to generate values from classification channels of the system for a population of particles in the sample. The method also includes identifying a region in a classification space in which the values for the populations are located. In addition, the method includes determining an optimized classification region for the population using one or more properties of the region. The optimized classification region contains a predetermined percentage of the values for the population. The optimized classification region is used for classification of particles in additional samples.
Public/Granted literature
- US20090237658A1 Methods for Altering One or More Parameters of a Measurement System Public/Granted day:2009-09-24
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