Invention Grant
- Patent Title: Substrate transfer apparatus, method of transferring substrate, and method of manufacturing electro-optical device
- Patent Title (中): 基板转印装置,基板转印方法以及电光装置的制造方法
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Application No.: US11368883Application Date: 2006-03-06
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Publication No.: US07881819B2Publication Date: 2011-02-01
- Inventor: Kazuo Tasaka , Hirokazu Fujishima
- Applicant: Kazuo Tasaka , Hirokazu Fujishima
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: AdvantEdge Law Group, LLC
- Priority: JP2005-094766 20050329
- Main IPC: G06F7/00
- IPC: G06F7/00

Abstract:
A substrate transfer apparatus transfers substrates stored in a first substrate storage case, which has support grooves in its inner wall, along the support grooves to substrate storage surfaces included in a second substrate storage case. The substrate transfer apparatus includes a first-substrate-storage-case placement section in which the first substrate storage case is placed, a second-substrate-storage-case placement section in which the second substrate storage case is placed, a substrate transfer mechanism that holds the substrates stored in the first substrate storage case so as to draw out the substrates from the first substrate storage case, and transfers the substrates to a substrate placement section of a substrate placing mechanism, a substrate holding mechanism that holds the substrates placed in the substrate placement section at hold positions, and discharges the substrates at discharge positions so as to dispose the substrates on the substrate storage surfaces of the second substrate storage case, and a transport mechanism that transports the substrate holding mechanism from the hold positions to the discharge positions.
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