Invention Grant
- Patent Title: Test pattern evaluation method and test pattern evaluation device
- Patent Title (中): 测试模式评估方法和测试模式评估装置
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Application No.: US12243314Application Date: 2008-10-01
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Publication No.: US07882467B2Publication Date: 2011-02-01
- Inventor: Toshimasa Kuchii
- Applicant: Toshimasa Kuchii
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Nixon & Vanderhye, P.C.
- Priority: JP2007-261333 20071004
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
Provided are an evaluation method and device of a test pattern which enable an appropriate evaluation in a reliability test with a simulation time reduced and high accuracy. It is assumed that each possible internal state of a cell determined at least by a logic value or a voltage value of an input terminal is a cell state, and each possible state of a transistor determined by a voltage between terminals of the transistor is a transistor state. The method comprises steps of: verifying operation of a semiconductor integrated circuit at a gate level or higher; acquiring an appearance cell state continuously appearing for a predetermined time or more in the operation verification; acquiring an appearance transistor state using the corresponding appearance cell state in the operation verification for each transistor; and calculating a test activity ratio of the transistor using the corresponding appearance transistor state for each transistor.
Public/Granted literature
- US20090094569A1 TEST PATTERN EVALUATION METHOD AND TEST PATTERN EVALUATION DEVICE Public/Granted day:2009-04-09
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