Invention Grant
- Patent Title: Method of manufacturing an actuator device
- Patent Title (中): 制造执行装置的方法
-
Application No.: US11869261Application Date: 2007-10-09
-
Publication No.: US07882607B2Publication Date: 2011-02-08
- Inventor: Xin-Shan Li
- Applicant: Xin-Shan Li
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-278009 20061011
- Main IPC: H01L41/053
- IPC: H01L41/053 ; H02N2/04

Abstract:
A method of manufacturing an actuator device includes forming a Zr layer on one surface of a substrate, forming a ZrO2 layer by oxidizing the Zr layer, forming a lower electrode on top of the ZrO2 layer, forming a piezoelectric layer on top of the lower electrode, and forming an upper electrode on top of the piezoelectric layer. In the method, in forming the Zr layer, the Zr layer is formed through crystal growth of Zr, and the Zr layer thus formed has special crystal regions that protrude from the opposite surface of the Zr layer from the substrate. Each special crystal region has a height of 10 to 100 nm and a diameter of 0.1 to 1 μm when viewed from above, and the special crystal regions exist with a density of 1.0×106 to 1.0×103/cm2.
Public/Granted literature
- US20080088207A1 ACTUATOR DEVICE, LIQUID-JET HEAD, AND METHOD OF MANUFACTURING ACTUATOR DEVICE Public/Granted day:2008-04-17
Information query
IPC分类: