Invention Grant
US07882618B2 Fabricating magnetic read heads with a reduced scratch exposure region
有权
制造具有减少的划痕曝光区域的磁读头
- Patent Title: Fabricating magnetic read heads with a reduced scratch exposure region
- Patent Title (中): 制造具有减少的划痕曝光区域的磁读头
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Application No.: US11957468Application Date: 2007-12-16
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Publication No.: US07882618B2Publication Date: 2011-02-08
- Inventor: David P. Druist , Mohamad T. Krounbi , David J. Seagle
- Applicant: David P. Druist , Mohamad T. Krounbi , David J. Seagle
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Duft Bornsen & Fishman, LLP
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
Methods of fabricating magnetic read heads are provided which reduce the width of the scratch exposure region of a read head. During normal fabrication processes, a read head is formed with a first shield, a read element formed on the first shield, and hard bias layers formed on either side of the read element. The width of the read elements and the hard bias layers define an initial scratch exposure region. According to embodiments herein, a mask structure is formed to protect the read element and first portions of the hard bias layers proximate to the read element. A removal process is then performed to remove second portions of the hard bias layers that are not protected by the mask structure, which defines a final scratch exposure region that is smaller than the initial scratch exposure region.
Public/Granted literature
- US20090151151A1 FABRICATING MAGNETIC READ HEADS WITH A REDUCED SCRATCH EXPOSURE REGION Public/Granted day:2009-06-18
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