Invention Grant
- Patent Title: System for gas cleaning
- Patent Title (中): 气体清洗系统
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Application No.: US12083945Application Date: 2006-09-09
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Publication No.: US07883559B2Publication Date: 2011-02-08
- Inventor: Knut Herges , Ralf Wnuk
- Applicant: Knut Herges , Ralf Wnuk
- Applicant Address: DE Neunkirchen
- Assignee: Hydac Process Technology GmbH
- Current Assignee: Hydac Process Technology GmbH
- Current Assignee Address: DE Neunkirchen
- Agency: Roylance, Abrams, Berdo & Goodman, LLP
- Priority: DE102005062245 20051224
- International Application: PCT/EP2006/008805 WO 20060909
- International Announcement: WO2007/073783 WO 20070705
- Main IPC: B01D50/00
- IPC: B01D50/00

Abstract:
A system for gas cleaning has at least one casing (1) with a first chamber (31) into which the gas to be cleaned can be flowed and with a second chamber (33) from which the cleaned gas exits. A filter device (35) can have the gas flow through it and can be arranged between the chambers. The filter device has filter media both for the separation of solid particles and for dehumidifying the gas by separating out coalesced liquid. The system has, upstream of the filter device (35), an arrangement (11, 37) for preliminary dehumidification of the gas.
Public/Granted literature
- US20090223186A1 System for Gas Cleaning Public/Granted day:2009-09-10
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