Invention Grant
- Patent Title: Additives to prevent degradation of cyclic alkene derivatives
- Patent Title (中): 用于防止环烯衍生物降解的添加剂
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Application No.: US11519524Application Date: 2006-09-12
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Publication No.: US07883639B2Publication Date: 2011-02-08
- Inventor: Daniel J. Teff , John L. Chagolla
- Applicant: Daniel J. Teff , John L. Chagolla
- Applicant Address: US RI North Kingstown
- Assignee: Fujifilm Electronic Materials, U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials, U.S.A., Inc.
- Current Assignee Address: US RI North Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: C09K15/08
- IPC: C09K15/08 ; C10L1/183 ; C23C16/00 ; H01L21/00

Abstract:
A stabilized cyclic alkene composition comprising one or more cyclic alkenes, and at least one antioxidant compound having the formula (I), wherein R1 through R5 can each independently be H, OH, C1-C8 linear, branched, or cyclic alkyl, C1-C8 linear, branched, or cyclic alkoxy or substituted or unsubstituted aryl, and wherein the antioxidant compound is present in an amount between 1 ppm and 200 ppm, and wherein said composition is purged with at least one inert gas after said composition is introduced to a container intended for storage or shipping of said composition. A method for forming a layer of carbon-doped silicon oxide on a substrate, which uses the stabilized alkene composition and a silicon containing compound.
Public/Granted literature
- US20070057234A1 Additives to prevent degradation of cyclic alkene derivatives Public/Granted day:2007-03-15
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