Invention Grant
US07883647B2 Method of making luminance enhancement optical substrates with optical defect masking structures
有权
制造具有光学缺陷掩模结构的亮度增强光学基片的方法
- Patent Title: Method of making luminance enhancement optical substrates with optical defect masking structures
- Patent Title (中): 制造具有光学缺陷掩模结构的亮度增强光学基片的方法
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Application No.: US11825139Application Date: 2007-07-02
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Publication No.: US07883647B2Publication Date: 2011-02-08
- Inventor: Kong-Hua Wang , Craig Lin , Daniel Yaw-Chung Ko
- Applicant: Kong-Hua Wang , Craig Lin , Daniel Yaw-Chung Ko
- Applicant Address: TW Taipei
- Assignee: Ubright Optronics Corporation
- Current Assignee: Ubright Optronics Corporation
- Current Assignee Address: TW Taipei
- Agency: Liu & Liu
- Main IPC: B29D11/00
- IPC: B29D11/00

Abstract:
An optical substrate possesses a structured surface that enhances luminance or brightness and reduces the effects of structural defects on perceived image quality. User perceivable image cosmetic defects caused by manufacturing or handling, can be masked by introducing structural irregularities in the optical substrate, which may be non-facet flat sections or in-kind to the defects. Optical defects caused by non-facet flat sections in the prism structure of the optical substrate (e.g., flat-bottom valleys with a certain valley bottom thickness above the base layer, and/or flat-top peaks, and/or openings in the optical substrates that expose flat sections of underlying base layer) can be masked by providing distributed in-kind non-facet flat sections (e.g., flat-bottom valleys, and/or flat-top peaks, and/or openings exposing sections of underlying base layer), to diffuse the prominence of the original defects with the introduced irregularities.
Public/Granted literature
- US20080019146A1 Luminance enhancement optical substrates with optical defect masking structures Public/Granted day:2008-01-24
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