Invention Grant
US07883779B2 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring
失效
包括颗粒监测单元，颗粒监测方法和程序的真空装置以及用于颗粒监测的窗口部件
- Patent Title: Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring
- Patent Title (中): 包括颗粒监测单元，颗粒监测方法和程序的真空装置以及用于颗粒监测的窗口部件
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Application No.: US11680426Application Date: 2007-02-28
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Publication No.: US07883779B2Publication Date: 2011-02-08
- Inventor: Tsuyoshi Moriya , Hiroyuki Nakayama
- Applicant: Tsuyoshi Moriya , Hiroyuki Nakayama
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-096456 20040329; JP2004-329675 20041112
- Main IPC: H01L21/306
- IPC: H01L21/306
Abstract:
A semiconductor manufacturing apparatus includes a processing chamber for performing a manufacturing processing on a wafer. A gas supply line for introducing a purge gas is connected to an upper portion of the processing chamber, a valve being installed on the gas supply line. A rough pumping line with a valve a is connected to a lower portion of the processing chamber. Installed on the rough pumping line are a dry pump for exhausting a gas in the processing chamber and a particle monitoring unit for monitoring particles between the valve a and the dry pump. In the semiconductor manufacturing apparatus, after the valve is opened, the purge gas is supplied to apply physical vibration due to shock wave in the processing chamber 100 so that deposits are detached therefrom to be monitored as particles.
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