Invention Grant
- Patent Title: Substrate with transparent conductive oxide film, process for its production and photoelectric conversion element
- Patent Title (中): 基板采用透明导电氧化膜,其生产工艺及光电转换元件
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Application No.: US11951137Application Date: 2007-12-05
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Publication No.: US07883789B2Publication Date: 2011-02-08
- Inventor: Kazuo Sato , Naoki Taneda , Makoto Fukawa , Nobutaka Aomine , Mika Kambe , Yukio Yoshikawa
- Applicant: Kazuo Sato , Junichi Sato, legal representative , Naoki Taneda , Makoto Fukawa , Nobutaka Aomine , Mika Kambe , Yukio Yoshikawa
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2001-322552 20011019
- Main IPC: B32B19/00
- IPC: B32B19/00

Abstract:
A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 μm) of solar ray, a process for its production, and a photoelectric conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.
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