Invention Grant
- Patent Title: Photosensitive planographic printing plate
- Patent Title (中): 感光平版印刷版
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Application No.: US11817876Application Date: 2006-03-15
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Publication No.: US07883830B2Publication Date: 2011-02-08
- Inventor: Koji Hayashi , Eiji Hayakawa
- Applicant: Koji Hayashi , Eiji Hayakawa
- Applicant Address: JP Chiyoda-Ku, Tokyo
- Assignee: Kodak Japan Ltd. and NEC Engineering Ltd.
- Current Assignee: Kodak Japan Ltd. and NEC Engineering Ltd.
- Current Assignee Address: JP Chiyoda-Ku, Tokyo
- Agent J. Lanny Tucker
- Priority: JP2005-099741 20050330
- International Application: PCT/JP2006/305619 WO 20060315
- International Announcement: WO2006/109454 WO 20061019
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/26
Abstract:
A photosensitive planographic printing plate comprising a substrate and a photosensitive layer including a photopolymerizable compound, wherein the photosensitive layer and the substrate are provided between them with an undercoat layer including a (co)polymer having structural units having ethylenically unsaturated groups bonded with silicon atoms and phosphonic acid groups.
Public/Granted literature
- US20080280228A1 Photosensitive Planographic Printing Plate Public/Granted day:2008-11-13
Information query
