Invention Grant
- Patent Title: Transparent electrically conductive film and process for producing the same
- Patent Title (中): 透明导电膜及其制造方法
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Application No.: US11918700Application Date: 2006-04-18
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Publication No.: US07883837B2Publication Date: 2011-02-08
- Inventor: Kohei Yamada , Hidekazu Shiomi , Hideyuki Yamada
- Applicant: Kohei Yamada , Hidekazu Shiomi , Hideyuki Yamada
- Applicant Address: JP Fukui-Shi, Fukui
- Assignee: Seiren Co., Ltd.
- Current Assignee: Seiren Co., Ltd.
- Current Assignee Address: JP Fukui-Shi, Fukui
- Agency: Dilworth & Barrese, LLP.
- Priority: JP2005-119492 20050418
- International Application: PCT/JP2006/308504 WO 20060418
- International Announcement: WO2006/112535 WO 20061026
- Main IPC: G03F1/00
- IPC: G03F1/00 ; H01L21/00

Abstract:
This invention provides a transparent electrically conductive film, which, while maintaining the light transparency of a transparent film, has excellent electrical conductivity, can be utilized for electromagnetic wave shielding, and does not cause inclusion of air bubbles in the lamination onto other base material, and a process for producing the same. The production process comprises the steps of forming a large number of concaves and convexes having an average height of not more than 0.1 μm on both sides or one side of a transparent film, forming a resist layer having a pattern shape opposite to the electrically conductive part in the electrically conductive film on the transparent film on its concave-convex side, applying a catalyst for plating onto the resist layer-formed face, separating the resist layer, forming a metal layer by plating, and blackening the metal layer, the metal layer satisfying 1≦W/T≦500 wherein W represents the width of the metal layer and T represents the height of the metal layer.
Public/Granted literature
- US20090042150A1 Transparent electrically conductive film and process for producing the same Public/Granted day:2009-02-12
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