Invention Grant
- Patent Title: Nonvolatile semiconductor memory and a fabrication method thereof
- Patent Title (中): 非易失性半导体存储器及其制造方法
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Application No.: US12181978Application Date: 2008-07-29
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Publication No.: US07883964B2Publication Date: 2011-02-08
- Inventor: Akira Goda , Hiroyuki Nitta
- Applicant: Akira Goda , Hiroyuki Nitta
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2003-342390 20030930
- Main IPC: H01L21/8247
- IPC: H01L21/8247

Abstract:
A nonvolatile semiconductor memory includes: a device region and a device isolating region, which have a pattern with a striped form that extends in a first direction, and are alternately and sequentially disposed at a first pitch in a second direction that is perpendicular to the first direction; and a contact made of a first conductive material, which is connected to the device region and disposed at the first pitch in the second direction. On a cross section of the second direction, the bottom width of the contact is longer than the top width of the contact, and the bottom width is longer than the width of the device region.
Public/Granted literature
- US20080293201A1 NONVOLATILE SEMICONDUCTOR MEMORY AND A FABRICATION METHOD THEREOF Public/Granted day:2008-11-27
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