Invention Grant
US07884387B2 Epitaxial wafer for semiconductor light emitting diode and semiconductor light emitting diode using same 有权
用于半导体发光二极管的外延晶片和使用其的半导体发光二极管

Epitaxial wafer for semiconductor light emitting diode and semiconductor light emitting diode using same
Abstract:
An epitaxial wafer for a semiconductor light emitting device according to the present invention in which at least an n-type cladding layer formed with a mixed crystal made of an AlGaInP material, an active layer, a p-type Mg-doped cladding layer, and a p-type contact layer are stacked successively in that order on an n-type GaAs substrate, and the p-type contact layer is formed as at least two layers that are an Mg-doped contact layer and a Zn-doped contact layer stacked thereon when viewed from the n-type GaAs substrate, comprises a Zn-doped layer which is inserted between the p-type Mg-doped cladding layer and the p-type contact layer.
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