Invention Grant
- Patent Title: Area-efficient gated diode structure and method of forming same
- Patent Title (中): 区域效能门控二极管结构及其形成方法
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Application No.: US12051116Application Date: 2008-03-19
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Publication No.: US07884411B2Publication Date: 2011-02-08
- Inventor: Leland Chang , Robert H. Dennard , David M. Fried , Wing Kin Luk
- Applicant: Leland Chang , Robert H. Dennard , David M. Fried , Wing Kin Luk
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Ryan, Mason & Lewis, LLP
- Agent Vazken Alexanian
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/76 ; H01L29/94 ; H01L27/01 ; H01L27/12

Abstract:
An area-efficient gated diode includes a semiconductor layer of a first conductivity type, an active region of a second conductivity type formed in the semiconductor layer proximate an upper surface thereof, and at least one trench electrode extending vertically through the active region and at least partially into the semiconductor layer. A first terminal of the gated diode is connected to the trench electrode, and a second terminal is connected to the active region. The gated diode is operative in one of at least first an second modes as a function of a voltage potential applied between the first and second terminals. The first mode is characterized by the creation of an inversion layer in the semiconductor layer surrounding the trench electrode. The gated diode has a first capacitance in the first mode and a second capacitance in the second mode, the first capacitance being greater than the second capacitance.
Public/Granted literature
- US20080164507A1 Area-Efficient Gated Diode Structure and Method of Forming Same Public/Granted day:2008-07-10
Information query
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