Invention Grant
- Patent Title: Lithographic apparatus and pivotable structure assembly
- Patent Title (中): 平版印刷设备和可枢转结构组件
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Application No.: US11812228Application Date: 2007-06-15
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Publication No.: US07884920B2Publication Date: 2011-02-08
- Inventor: Hermanus Mathias Joannes Rene Soemers , Felix Godfried Peter Peeters
- Applicant: Hermanus Mathias Joannes Rene Soemers , Felix Godfried Peter Peeters
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A mirror assembly to interact with a beam of radiation of a lithographic apparatus is disclosed. The mirror assembly includes a mirror, a piezo electric actuator, and a mover structure, the mover structure connected to the mirror, an assembly of the mirror and the mover structure being pivotable about a pivot point, the piezo electric actuator having a contacting surface to establish a slip-stick contact with the mover structure.
Public/Granted literature
- US20080309901A1 Lithographic apparatus and pivotable structure assembly Public/Granted day:2008-12-18
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