Invention Grant
- Patent Title: Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method
- Patent Title (中): 照明光学装置,投影曝光装置,投影光学系统和装置制造方法
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Application No.: US11783557Application Date: 2007-04-10
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Publication No.: US07884921B2Publication Date: 2011-02-08
- Inventor: Michio Noboru , Naomasa Shiraishi
- Applicant: Michio Noboru , Naomasa Shiraishi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-110342 20060412
- Main IPC: G02B27/10
- IPC: G02B27/10 ; G03B27/42 ; G03B27/44 ; G03B27/54 ; G03B27/52

Abstract:
An illumination optical apparatus, used in a projection exposure apparatus for projecting and exposing a pattern arranged in a first plane to a second plane, for supplying the first surface with illumination light from a light source comprises an optical path combiner arranged in an optical path between the light source and the first surface, for combining a plurality of light beams different from each other from the light source such that the first and second light beams illuminate the first surface closely to each other. The optical path combiner includes a discrete point positioned on or near a third surface optically conjugate with the first surface. The plurality of light beams travel by way of a plurality of regions sectioned by the discrete point, respectively.
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