Invention Grant
- Patent Title: Extreme ultraviolet light and X-ray source target and manufacturing method thereof
- Patent Title (中): 极紫外光和X射线源靶及其制造方法
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Application No.: US11792923Application Date: 2005-08-29
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Publication No.: US07885387B2Publication Date: 2011-02-08
- Inventor: Keiji Nagai , Qincui Gu , Takayoshi Norimatsu , Shinsuke Fujioka , Hiroaki Nishimura , Katsunobu Nishihara , Noriaki Miyanaga , Yasukazu Izawa
- Applicant: Keiji Nagai , Qincui Gu , Takayoshi Norimatsu , Shinsuke Fujioka , Hiroaki Nishimura , Katsunobu Nishihara , Noriaki Miyanaga , Yasukazu Izawa
- Applicant Address: JP Osaka
- Assignee: Osaka University
- Current Assignee: Osaka University
- Current Assignee Address: JP Osaka
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-366732 20041217; JP2005-045005 20050222
- International Application: PCT/JP2005/015621 WO 20050829
- International Announcement: WO2006/064592 WO 20060622
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
The present invention is made to provide an extreme ultraviolet light source target or an X-ray source target having a good operationality. An extreme ultraviolet light source target in accordance with an aspect of the present invention is obtained by including a heavy metal such as tin into a matrix made of a polymeric material such as hydroxylpropylcellulose (HPC). The target can be manufactured by mixing the heavy metal and the polymeric material with a solvent, and evaporating the solvent. Since the target uses the polymeric material as a matrix, the target can be easily deformed to have a desired shape. For this reason, the target can be easily attached to a target holder irrespective of the shape of the holder, resulting in a good operationality of the target. Furthermore, an emission efficiency can be improved by including the heavy metal at a low density.
Public/Granted literature
- US20080157011A1 Extreme Ultraviolet Light and X-Ray Source Target and Manufacturing Method Thereof Public/Granted day:2008-07-03
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