Invention Grant
- Patent Title: Apparatus and method for quantitatively measuring liquid film drying rates on substrates
- Patent Title (中): 用于定量测量底物上液膜干燥速率的装置和方法
-
Application No.: US10522972Application Date: 2003-08-08
-
Publication No.: US07886590B2Publication Date: 2011-02-15
- Inventor: Ryszard Sprycha , Doreen E. Smith , David Biro , Juanita Parris , Mikhail Laksin , Gregory Pace
- Applicant: Ryszard Sprycha , Doreen E. Smith , David Biro , Juanita Parris , Mikhail Laksin , Gregory Pace
- Applicant Address: US NJ Parsippany
- Assignee: Sun Chemical Corporation
- Current Assignee: Sun Chemical Corporation
- Current Assignee Address: US NJ Parsippany
- Agency: Kramer Levin Naftalis & Frankel LLP
- International Application: PCT/US03/25137 WO 20030808
- International Announcement: WO2004/015379 WO 20040219
- Main IPC: G01N17/00
- IPC: G01N17/00 ; G01B21/08
Abstract:
An apparatus and method for measuring the drying rate of a liquid or liquid film in air or other gaseous media by either: a) measuring changes in the print density of the liquid; b) measuring changes in the dynamic surface tension of the liquid; c) measuring the differential pressure between an inert gas required to displace a sample of the liquid drawn into a capillary tube from a reservoir of the liquid and the pressure required for a bubble of the gas to form in the reservoir; and d) measuring the electrical conductance or resistance of the liquid.
Public/Granted literature
- US20080209996A1 Apparatus and Method for Quantitatively Measuring Liquid Film Drying Rates on Substrates Public/Granted day:2008-09-04
Information query
