Invention Grant
- Patent Title: High purity copper sulfate and method for production thereof
- Patent Title (中): 高纯度硫酸铜及其制造方法
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Application No.: US10522273Application Date: 2003-08-12
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Publication No.: US07887603B2Publication Date: 2011-02-15
- Inventor: Yuichiro Shindo , Kouichi Takemoto
- Applicant: Yuichiro Shindo , Kouichi Takemoto
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Howson & Howson LLP
- Priority: JP2002-259755 20020905
- International Application: PCT/JP03/10251 WO 20030812
- International Announcement: WO2004/022486 WO 20040318
- Main IPC: B01D9/00
- IPC: B01D9/00

Abstract:
High purity copper sulfate having a purity of 99.99% or higher and in which the content of transition metals such as Fe, Cr, Ni is 3 wtppm or less; and a method for producing such high purity copper sulfate which includes the steps of dissolving copper sulfate crystals in purified water, performing evaporative concentration thereto, removing the crystals precipitated initially, performing further evaporative concentration to effect crystallization, and subjecting this to filtration to obtain high purity copper sulfate. This manufacturing method of high purity copper sulfate allows the efficient removal of impurities from commercially available copper sulfate crystals at a low cost through dissolution with purified water and thermal concentration.
Public/Granted literature
- US20050232849A1 High purity copper sulfate and method for production thereof Public/Granted day:2005-10-20
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