Invention Grant
- Patent Title: Plasma fluorination treatment of porous materials
- Patent Title (中): 多孔材料的等离子体氟化处理
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Application No.: US10293830Application Date: 2002-11-13
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Publication No.: US07887889B2Publication Date: 2011-02-15
- Inventor: Moses M. David , Gina M. Buccellato , John S. Huberty , Seth M. Kirk
- Applicant: Moses M. David , Gina M. Buccellato , John S. Huberty , Seth M. Kirk
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent Karl G. Hanson
- Main IPC: C08J7/18
- IPC: C08J7/18 ; H05H1/46
Abstract:
The application discloses articles and methods of plasma fluorination treatment that employ a capacitively-coupled system to fluorinate porous articles. The methods include placing the article to be treated within an ion sheath adjacent to an electrode and placing the article to be treated between powered and grounded electrodes separated by about 25 mm or less.
Public/Granted literature
- US20030134515A1 Plasma fluorination treatment of porous materials Public/Granted day:2003-07-17
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