Invention Grant
- Patent Title: Photosensitive paste and process for production of pattern using the same
- Patent Title (中): 感光膏和使用相同的图案生产过程
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Application No.: US12342163Application Date: 2008-12-23
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Publication No.: US07887992B2Publication Date: 2011-02-15
- Inventor: Kazushige Ito , Hiroaki Noda
- Applicant: Kazushige Ito , Hiroaki Noda
- Applicant Address: US DE Wilmington
- Assignee: E. I. du Pont de Nemours and Company
- Current Assignee: E. I. du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/40
Abstract:
Disclosed is a photosensitive paste comprising a polymerizable monomer and a photopolymerization initiator, wherein the glass transition temperature of the polymerizable monomer is −10° C. or less. The present paste may be used for creating a fine pattern and prevents residue from remaining in the area where paste should be removed.
Public/Granted literature
- US20100159391A1 PHOTOSENSITIVE PASTE AND PROCESS FOR PRODUCTION OF PATTERN USING THE SAME Public/Granted day:2010-06-24
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