Invention Grant
- Patent Title: Semiconductor device manufacturing method
- Patent Title (中): 半导体器件制造方法
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Application No.: US12496406Application Date: 2009-07-01
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Publication No.: US07888239B2Publication Date: 2011-02-15
- Inventor: Masaru Nakamura , Masatoshi Wakahara , Motoko Nakayama , Yuki Nakamura
- Applicant: Masaru Nakamura , Masatoshi Wakahara , Motoko Nakayama , Yuki Nakamura
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer, Burns & Crain, Ltd
- Priority: JP2008-187423 20080718
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L21/46

Abstract:
In a semiconductor device manufacturing method in which a wafer formed with devices in a plurality of areas sectioned by a plurality of streets formed in a lattice-like pattern on the front surface is divided into the individual devices along the streets, when the wafer is divided into the individual devices by exposing cut grooves formed along the streets by a dicing before grinding process, a rigid plate is applied to the front surface of the wafer and an adhesive film is attached to the rear surface of the wafer. Thereafter, a separation groove forming step is performed in which a laser beam is directed to the adhesive film along the cut grooves from the dicing tape side applied with the wafer attached with the adhesive film to form separation grooves in the adhesive film along the cut grooves.
Public/Granted literature
- US20100015784A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD Public/Granted day:2010-01-21
Information query
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