Invention Grant
- Patent Title: Photoelectric conversion device, imaging device, and process for producing the photoelectric conversion device
- Patent Title (中): 光电转换装置，成像装置以及光电转换装置的制造方法
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Application No.: US11508174Application Date: 2006-08-23
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Publication No.: US07888759B2Publication Date: 2011-02-15
- Inventor: Mikio Ihama
- Applicant: Mikio Ihama
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPP2005-240965 20050823
- Main IPC: H01L27/146
- IPC: H01L27/146
Abstract:
A photoelectric conversion device comprising: a semiconductor substrate; an inorganic photoelectric conversion layer provided within the semiconductor substrate; and an organic photoelectric conversion layer provided above the inorganic photoelectric conversion layer, wherein the organic photoelectric conversion layer is prepared by a shadow mask method.
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