Invention Grant
US07889315B2 Lithographic apparatus, lens interferometer and device manufacturing method
有权
平版印刷设备，透镜干涉仪和器件制造方法
- Patent Title: Lithographic apparatus, lens interferometer and device manufacturing method
- Patent Title (中): 平版印刷设备，透镜干涉仪和器件制造方法
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Application No.: US11403193Application Date: 2006-04-13
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Publication No.: US07889315B2Publication Date: 2011-02-15
- Inventor: Marcus Adrianus Van De Kerkhof
- Applicant: Marcus Adrianus Van De Kerkhof
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A lithographic apparatus includes an illumination system that is configured to condition a radiation beam; a projection system that is configured to project at least a portion of the radiation beam as a projected radiation beam; and a lens interferometer for sensing a wavefront state of the projected radiation beam. The lens interferometer is provided with a polarizing element so as to be capable of sensing a polarisation state of the projected radiation beam.
Public/Granted literature
- US20070242256A1 Lithographic apparatus, lens interferometer and device manufacturing method Public/Granted day:2007-10-18
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