Invention Grant
US07889320B2 Variable slit apparatus, illumination apparatus, exposure apparatus, exposure method, and device fabrication method
有权
可变狭缝装置,照明装置,曝光装置,曝光方法和装置制造方法
- Patent Title: Variable slit apparatus, illumination apparatus, exposure apparatus, exposure method, and device fabrication method
- Patent Title (中): 可变狭缝装置,照明装置,曝光装置,曝光方法和装置制造方法
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Application No.: US11430917Application Date: 2006-05-10
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Publication No.: US07889320B2Publication Date: 2011-02-15
- Inventor: Eizo Ohya , Kyoji Nakamura , Yasushi Mizuno
- Applicant: Eizo Ohya , Kyoji Nakamura , Yasushi Mizuno
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-383880 20031113
- Main IPC: G03B27/54
- IPC: G03B27/54

Abstract:
The present invention provides a variable slit apparatus, which can rapidly change the shape of the slit width of the illumination light while finely controlling the shape of the slit-shaped illumination light, an illumination apparatus that uses such, an exposure apparatus, and the like. The variable slit apparatus for forming a slit-shaped illumination light comprises: a first light-shielding mechanism that comprises a plurality of blades for defining one long side of the illumination light; a second light-mechanism configured to define another long side of the illumination light; and a drive mechanism that changes the width of the illumination light in the latitudinal direction orthogonal to the longitudinal direction by driving the first light-shielding mechanism and the second light-shielding mechanism.
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