Invention Grant
US07889321B2 Illumination system for illuminating a patterning device and method for manufacturing an illumination system
失效
用于照射图案形成装置的照明系统和用于制造照明系统的方法
- Patent Title: Illumination system for illuminating a patterning device and method for manufacturing an illumination system
- Patent Title (中): 用于照射图案形成装置的照明系统和用于制造照明系统的方法
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Application No.: US11730751Application Date: 2007-04-03
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Publication No.: US07889321B2Publication Date: 2011-02-15
- Inventor: Jan Bernard Plechelmus Van Schoot , Hendricus Johannes Maria Meijer
- Applicant: Jan Bernard Plechelmus Van Schoot , Hendricus Johannes Maria Meijer
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42
Abstract:
An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.
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