Invention Grant
- Patent Title: Method for positioning a target portion of a substrate with respect to a focal plane of a projection system
- Patent Title (中): 用于相对于投影系统的焦平面定位基板的目标部分的方法
-
Application No.: US12795449Application Date: 2010-06-07
-
Publication No.: US07889357B2Publication Date: 2011-02-15
- Inventor: Cornelis Henricus Van De Vin , Ralph Brinkhof , Arthur Winfried Eduardus Minnaert , Alex Van Zon
- Applicant: Cornelis Henricus Van De Vin , Ralph Brinkhof , Arthur Winfried Eduardus Minnaert , Alex Van Zon
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01B11/14
- IPC: G01B11/14
Abstract:
A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.
Public/Granted literature
Information query
