Invention Grant
- Patent Title: Non-volatile semiconductor device
- Patent Title (中): 非易失性半导体器件
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Application No.: US12068409Application Date: 2008-02-06
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Publication No.: US07889552B2Publication Date: 2011-02-15
- Inventor: Jae-chul Park , Jae-woong Hyun , Young-soo Park , Sun-il Kim
- Applicant: Jae-chul Park , Jae-woong Hyun , Young-soo Park , Sun-il Kim
- Applicant Address: KR Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2007-0065684 20070629
- Main IPC: G11C11/34
- IPC: G11C11/34 ; G11C16/04

Abstract:
A nonvolatile semiconductor device according to example embodiments may include a plurality of memory cells on a semiconductor substrate and at least one selection transistor on the semiconductor substrate, wherein the at least one selection transistor may be disposed at a different level from the plurality of memory cells. The at least one selection transistor may be connected to a data line and/or a power source line via a first contact and/or a third contact, respectively. The at least one selection transistor may be connected to the plurality of memory cells via a second contact and/or a fourth contact. The active layer of the at least one selection transistor may contain an oxide. Accordingly, the nonvolatile semiconductor device according to example embodiments may include a selection transistor having a reduced size.
Public/Granted literature
- US20090003062A1 Non-volatile semiconductor device Public/Granted day:2009-01-01
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