Invention Grant
- Patent Title: Low temperature solids removal system for gasification
- Patent Title (中): 用于气化的低温固体去除系统
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Application No.: US11938564Application Date: 2007-11-12
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Publication No.: US07896955B2Publication Date: 2011-03-01
- Inventor: Paul Steven Wallace , Jyung-Hoon Kim
- Applicant: Paul Steven Wallace , Jyung-Hoon Kim
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Cantor Colburn LLP
- Main IPC: B01D47/00
- IPC: B01D47/00

Abstract:
Disclosed is a process for removing coarse solids and fine solids from a gas, which includes wetting the coarse solids and fine solids in a first chamber thereby separating the coarse solids and fine solids from the gas. The first chamber also contains liquid to cool the coarse solids and the fine solids. The coarse solids and fine solids are routed to a liquid-filled second chamber where the coarse solids settle to the bottom. The liquid in the second chamber, still containing the fine solids is flushed into a third chamber where the fine solids are separated from the liquid. The separated fine solids and coarse solids are then routed to a fourth chamber.
Public/Granted literature
- US20090120290A1 LOW TEMPERATURE SOLIDS REMOVAL SYSTEM FOR GASIFICATION Public/Granted day:2009-05-14
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