Invention Grant
- Patent Title: Substrate holding apparatus and substrate polishing apparatus
- Patent Title (中): 基板保持装置和基板研磨装置
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Application No.: US12136424Application Date: 2008-06-10
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Publication No.: US07897007B2Publication Date: 2011-03-01
- Inventor: Yoshihiro Gunji , Hozumi Yasuda , Keisuke Namiki , Hiroshi Yoshida
- Applicant: Yoshihiro Gunji , Hozumi Yasuda , Keisuke Namiki , Hiroshi Yoshida
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2000-231892 20000731; JP2000-280216 20000914
- Main IPC: B24B41/06
- IPC: B24B41/06 ; B24B37/04 ; H01L21/304

Abstract:
A substrate holding apparatus has a substrate holder body with a substrate holding side facing a polishing surface and holding a substrate on the substrate holding side and a retainer ring fixedly secured to the substrate holder body. The retainer ring is arranged to surround an outer periphery of the substrate held by the substrate holder body so that the retainer ring engages with the polishing surface radially outside the substrate as the polishing of the substrate is effected. The substrate holder body is provided with a membrane having inside and outside surfaces. The inside surface cooperates with a surface of the substrate holder body to define a fluid pressure chamber to which a fluid pressure is applied. The outer surface engages with the substrate held by the substrate holder body.
Public/Granted literature
- US20080299880A1 SUBSTRATE HOLDING APPARATUS AND SUBSTRATE POLISHING APPARATUS Public/Granted day:2008-12-04
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