Invention Grant
- Patent Title: Method for manufacturing magnetoresistance effect element
- Patent Title (中): 制造磁阻效应元件的方法
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Application No.: US11703830Application Date: 2007-02-08
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Publication No.: US07897201B2Publication Date: 2011-03-01
- Inventor: Hiromi Yuasa , Hideaki Fukuzawa , Yoshihiko Fuji , Hitoshi Iwasaki
- Applicant: Hiromi Yuasa , Hideaki Fukuzawa , Yoshihiko Fuji , Hitoshi Iwasaki
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye, PC
- Priority: JPP2006-032261 20060209
- Main IPC: G11B21/00
- IPC: G11B21/00 ; B05D3/00 ; H05H1/00 ; C23F3/00

Abstract:
A method is for manufacturing a magnetoresistance effect element having a magnetization fixed layer, a non-magnetic intermediate layer, and a magnetization free layer being sequentially stacked. The method includes: forming at least a part of a magnetic layer that is to become either one of the magnetization fixed layer and the magnetization free layer; forming a function layer including at least one of an oxide, a nitride, and a fluoride on the part of the magnetic layer; and removing a part of the function layer by exposing the function layer to either one of an ion beam and plasma irradiation.
Public/Granted literature
- US20070202249A1 Method for manufacturing magnetoresistance effect element Public/Granted day:2007-08-30
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