A method for forming a film pattern made of a high-performance material by arranging a functional fluid on a base substrate and drying the functional fluid, the functional fluid being the high-performance material dissolved or dispersed in a solvent is provided. The method includes: forming liquid reception portions in an effective area and a non-effective area of the base substrate on which the film pattern is to be formed, the non-effective area surrounding the effective area; arranging the functional fluid in the liquid reception portions formed in the effective area; and arranging the functional fluid or the solvent in the liquid reception portions formed in the non-effective area, wherein, in the non-effective area, larger amounts of the solvent are arranged in the liquid reception portions in areas that are more distant from a center of the effective area.