Invention Grant
- Patent Title: Solid state imaging device and fabrication method of solid state imaging device
- Patent Title (中): 固态成像装置及固态成像装置的制造方法
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Application No.: US12059151Application Date: 2008-03-31
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Publication No.: US07897426B2Publication Date: 2011-03-01
- Inventor: Yoshiki Maehara
- Applicant: Yoshiki Maehara
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-094374 20070330
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A solid state imaging device comprises: photoelectric conversion portions on or above a substrate; and color filters on or above the respective photoelectric conversion portions. Each of the photoelectric conversion portions comprises: a lower electrode on or above the substrate; a photoelectric conversion film on or above the lower electrode; and an upper electrode on or above the photoelectric conversion film. The device further comprises: a first inorganic material film that protects each of the photoelectric conversion portions, is formed by a first method and is above the upper electrode and below the color filters; a second inorganic material film that prevents characteristic deterioration of the photoelectric conversion portion caused by the first method, is formed by a second method and is between the upper electrode and the first inorganic material film; and a polymeric material film that enhances a function of the first inorganic material film and is on or above the first inorganic material film.
Public/Granted literature
- US20080246107A1 SOLID STATE IMAGING DEVICE AND FABRICATION METHOD OF SOLID STATE IMAGING DEVICE Public/Granted day:2008-10-09
Information query
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