Invention Grant
US07897430B2 Organic thin film transistors including metal oxide nanoparticles within a photocurable transparent polymer gate insulator layer and method for fabricating the same by using sol-gel and photocuring reactions
有权
包含可光固化透明聚合物栅极绝缘体层内的金属氧化物纳米粒子的有机薄膜晶体管及其制造方法,使用溶胶 - 凝胶和光固化反应
- Patent Title: Organic thin film transistors including metal oxide nanoparticles within a photocurable transparent polymer gate insulator layer and method for fabricating the same by using sol-gel and photocuring reactions
- Patent Title (中): 包含可光固化透明聚合物栅极绝缘体层内的金属氧化物纳米粒子的有机薄膜晶体管及其制造方法,使用溶胶 - 凝胶和光固化反应
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Application No.: US12361000Application Date: 2009-01-28
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Publication No.: US07897430B2Publication Date: 2011-03-01
- Inventor: Jai Kyeong Kim , Dong Young Kim , June Whan Choi , Ho Gyu Yoon
- Applicant: Jai Kyeong Kim , Dong Young Kim , June Whan Choi , Ho Gyu Yoon
- Applicant Address: KR Seoul
- Assignee: Korea Institute of Science and Technology
- Current Assignee: Korea Institute of Science and Technology
- Current Assignee Address: KR Seoul
- Agent Jones Day
- Priority: KR10-2008-0008816 20080129
- Main IPC: H01L51/40
- IPC: H01L51/40

Abstract:
The present invention relates to an organic thin film transistor comprising a photocurable transparent inorganic/polymer composite layer as a gate insulator layer in which metal oxide nanoparticles are generated within a photocurable transparent polymer through sol-gel and photocuring reactions and whose permittivity is easily regulated; and a fabrication method thereof. Since the organic thin film transistor according to the present invention utilizes the photocurable transparent inorganic/polymer composite layer showing a significantly high and readily controllable permittivity as a gate insulator, it is capable of operating under low voltage conditions and has a high on/off current ratio due to low leakage current. Further, the organic thin film transistor according to the present invention preserves the unique properties of the photocurable transparent polymer, enabling the formation of a photocurable micropattern of a gate insulator having high processibility.
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