Invention Grant
- Patent Title: Semiconductor wafer coat layers and methods therefor
- Patent Title (中): 半导体晶片涂层及其方法
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Application No.: US11801465Application Date: 2007-05-09
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Publication No.: US07897486B2Publication Date: 2011-03-01
- Inventor: Eric J. Li , Daoqiang Lu , Christopher L. Rumer , Paul A. Koning , Darcy E. Fleming , Gudbjorg H. Oskarsdottir , Tiffany Byrne
- Applicant: Eric J. Li , Daoqiang Lu , Christopher L. Rumer , Paul A. Koning , Darcy E. Fleming , Gudbjorg H. Oskarsdottir , Tiffany Byrne
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Formulations and processes for forming wafer coat layers are disclosed. In one embodiment, an organic surface protectant is incorporated into a wafer coat formulation deposited onto a semiconductor wafer prior to the laser scribe operation. Upon removal of the wafer coat layer, the organic surface protectant remains on the bumps and thereby prevents oxidation of the bumps between die prep and chip and attach. In an alternative embodiment, an ultraviolet light absorber is added to the wafer coat formulation to enhance the wafer coat layer's energy absorption and thereby improve the laser's ability to ablate the wafer coat layer. In an alternative embodiment, a conformal wafer coat layer is deposited on the wafer and die bumps, thereby reducing wafer coat layer thickness variations that can impact the laser scribing ability.
Public/Granted literature
- US20070218652A1 Semiconductor wafer coat layers and methods therefor Public/Granted day:2007-09-20
Information query
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