Invention Grant
- Patent Title: Laser processing method and chip
- Patent Title (中): 激光加工方法和芯片
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Application No.: US11822151Application Date: 2007-07-02
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Publication No.: US07897487B2Publication Date: 2011-03-01
- Inventor: Ryuji Sugiura , Takeshi Sakamoto
- Applicant: Ryuji Sugiura , Takeshi Sakamoto
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JPP2006-183498 20060703; JPP2006-221161 20060814
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An object to be processed can be cut highly accurately along a line to cut.An object to be processed 1 is irradiated with laser light while locating a converging point within a silicon wafer 11, and the converging point is relatively moved along a line to cut 5, so as to form modified regions M1, M2 positioned within the object 1 along the line to cut 5, and then a modified region M3 positioned between the modified regions M1, M2 within the object 1.
Public/Granted literature
- US20080000884A1 Laser processing method and chip Public/Granted day:2008-01-03
Information query
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