Invention Grant
- Patent Title: Apparatus and method for transformation of substrate
- Patent Title (中): 底物转化装置及方法
-
Application No.: US12587399Application Date: 2009-10-06
-
Publication No.: US07897492B2Publication Date: 2011-03-01
- Inventor: Nathaniel R. Quick
- Applicant: Nathaniel R. Quick
- Agency: Frijouf, Rust & Pyle, P.A.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method is disclosed for forming a layer of a wide bandgap material in a non-wide bandgap material. The method comprises providing a substrate of a non-wide bandgap material and converting a layer of the non-wide bandgap material into a layer of a wide bandgap material. An improved component such as wide bandgap semiconductor device may be formed within the wide bandgap material through a further conversion process.
Public/Granted literature
- US20100025694A1 Apparatus and method for transformation of substrate Public/Granted day:2010-02-04
Information query
IPC分类: