Invention Grant
- Patent Title: System and method for focused ion beam data analysis
- Patent Title (中): 用于聚焦离子束数据分析的系统和方法
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Application No.: US11667789Application Date: 2005-11-15
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Publication No.: US07897918B2Publication Date: 2011-03-01
- Inventor: Michael William Phaneuf , Michael Anthony Anderson , Ken Guillaume Lagarec
- Applicant: Michael William Phaneuf , Michael Anthony Anderson , Ken Guillaume Lagarec
- Applicant Address: US CA Fremont
- Assignee: DCG Systems
- Current Assignee: DCG Systems
- Current Assignee Address: US CA Fremont
- Agency: Nixon Peabody LLP.
- Agent Joseph Bach, Esq.
- International Application: PCT/CA2005/001733 WO 20051115
- International Announcement: WO2006/050613 WO 20060518
- Main IPC: G21K5/02
- IPC: G21K5/02

Abstract:
A system and method for improving FIB milling endpointing operations. The methods involve generating real-time images of the area being milled and real-time graphical plots of pixel intensities with an increased sensitivity over native FIB system generated images and plots. The images and plots are generated with raw signal data obtained from the native FIB system. More specifically, the raw signal data is processed according to specific algorithms for generating images and corresponding intensity graphs which can be reliably used for accurate endpointing. In particular, the displayed images will display more visual information regarding changes in milled material, while the intensity graphs will plot aggregate pixel intensity data on a dynamically adjusting scale to dramatically highlight relative changes in milled material.
Public/Granted literature
- US20090135240A1 System and Method for Focused Ion Beam Data Analysis Public/Granted day:2009-05-28
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