Invention Grant
- Patent Title: Lithographic apparatus, device manufacturing method, and use of a radiation collector
- Patent Title (中): 光刻设备，器件制造方法和辐射收集器的使用
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Application No.: US12289778Application Date: 2008-11-04
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Publication No.: US07897941B2Publication Date: 2011-03-01
- Inventor: Johannes Christiaan Leonardus Franken , Alexander Matthijs Struycken , Leon Joseph Marie Van Den Schoor
- Applicant: Johannes Christiaan Leonardus Franken , Alexander Matthijs Struycken , Leon Joseph Marie Van Den Schoor
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01N21/33
- IPC: G01N21/33 ; G03B27/72 ; B08B3/10
Abstract:
A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.
Public/Granted literature
- US20090066924A1 Lithographic apparatus, device manufacturing method, and use of a radiation collector Public/Granted day:2009-03-12
Information query
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