Invention Grant
- Patent Title: Through substrate annular via including plug filler
- Patent Title (中): 通过基底环形通孔,包括塞子填料
-
Application No.: US12032642Application Date: 2008-02-16
-
Publication No.: US07898063B2Publication Date: 2011-03-01
- Inventor: Peter James Lindgren , Edmund Juris Sprogis , Anthony Kendall Stamper , Kenneth Jay Stein
- Applicant: Peter James Lindgren , Edmund Juris Sprogis , Anthony Kendall Stamper , Kenneth Jay Stein
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Richard M. Kotulak, Esq.
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A through substrate via includes an annular conductor layer at a periphery of a through substrate aperture, and a plug layer surrounded by the annular conductor layer. A method for fabricating the through substrate via includes forming a blind aperture within a substrate and successively forming and subsequently planarizing within the blind aperture a conformal conductor layer that does not fill the aperture and plug layer that does fill the aperture. The backside of the substrate may then be planarized to expose at least the planarized conformal conductor layer.
Public/Granted literature
- US20090206488A1 THROUGH SUBSTRATE ANNULAR VIA INCLUDING PLUG FILLER Public/Granted day:2009-08-20
Information query
IPC分类: