Invention Grant
US07898645B2 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
有权
基板输送装置及方法，曝光装置及曝光方法以及装置的制造方法
- Patent Title: Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
- Patent Title (中): 基板输送装置及方法，曝光装置及曝光方法以及装置的制造方法
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Application No.: US11398603Application Date: 2006-04-06
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Publication No.: US07898645B2Publication Date: 2011-03-01
- Inventor: Nobuyoshi Tanno , Takashi Horiuchi
- Applicant: Nobuyoshi Tanno , Takashi Horiuchi
- Applicant Address: JP Katta-gun JP Tokyo
- Assignee: Zao Nikon Co., Ltd.,Nikon Corporation
- Current Assignee: Zao Nikon Co., Ltd.,Nikon Corporation
- Current Assignee Address: JP Katta-gun JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-349549 20031008; JP2003-349552 20031008
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/58
Abstract:
A substrate transport apparatus, which transports a substrate that has been exposed with an image of a pattern through a projection optical system and a liquid, comprises a substrate support member that supports the substrate, and a liquid removal mechanism that removes the liquid that has adhered to at least one of the substrate support member and at least a portion of the area of the rear surface of the substrate.
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