Invention Grant
- Patent Title: Using an interferometer as a high speed variable attenuator
- Patent Title (中): 使用干涉仪作为高速可变衰减器
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Application No.: US11866820Application Date: 2007-10-03
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Publication No.: US07898646B2Publication Date: 2011-03-01
- Inventor: Oscar Franciscus Jozephus Noordman , Justin L. Kreuzer , Henri Johannes Petrus Vink , Teunis Cornelis Van Den Dool , Daniel Perez Calero
- Applicant: Oscar Franciscus Jozephus Noordman , Justin L. Kreuzer , Henri Johannes Petrus Vink , Teunis Cornelis Van Den Dool , Daniel Perez Calero
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G01J1/36
- IPC: G01J1/36 ; G01J1/32 ; G03B27/74
Abstract:
A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.
Public/Granted literature
- US20080106717A1 Using an Interferometer as a High Speed Variable Attenuator Public/Granted day:2008-05-08
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